Edge-induced flattening in the fabrication of ultrathin freestanding crystalline silicon sheets
Crossref DOI link: https://doi.org/10.1063/1.4789553
Published Online: 2013-01-25
Published Print: 2013-01-21
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Gopalakrishnan, Gokul
Czaplewski, David A.
McElhinny, Kyle M.
Holt, Martin V.
Silva-MartÃnez, Juan C.
Evans, Paul G.
Funding for this research was provided by:
U.S. Department of Energy (DE-AC02-06CH11357)
Air Force Office of Scientific Research (FA9550-10-1-0249)