Electrical characterisation and predictive simulation of defects induced by keV Si+ implantation in n-type Si
Crossref DOI link: https://doi.org/10.1063/1.4804332
Published Online: 2013-05-13
Published Print: 2013-05-14
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Nyamhere, C.
Cristiano, F.
Olivie, F.
Essa, Z.
Bedel-Pereira, E.
Bolze, D.
Yamamoto, Y.