Fluorocarbon assisted atomic layer etching of SiO2 using cyclic Ar/C4F8 plasma
Crossref DOI link: https://doi.org/10.1116/1.4843575
Published Online: 2013-12-12
Published Print: 2014-03-01
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Metzler, Dominik
Bruce, Robert L.
Engelmann, Sebastian
Joseph, Eric A.
Oehrlein, Gottlieb S.
Funding for this research was provided by:
NSF (CBET-1134273)