Polymethyl methacrylate/hydrogen silsesquioxane bilayer resist electron beam lithography process for etching 25 nm wide magnetic wires
Crossref DOI link: https://doi.org/10.1116/1.4867753
Published Online: 2014-03-07
Published Print: 2014-03-01
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Currivan, Jean Anne
Siddiqui, Saima
Ahn, Sungmin
Tryputen, Larysa
Beach, Geoffrey S. D.
Baldo, Marc A.
Ross, Caroline A.