Photo-assisted etching of silicon in chlorine- and bromine-containing plasmas
Crossref DOI link: https://doi.org/10.1063/1.4878895
Published Online: 2014-05-28
Published Print: 2014-05-28
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Zhu, Weiye
Sridhar, Shyam
Liu, Lei
Hernandez, Eduardo
Donnelly, Vincent M.
Economou, Demetre J.
Funding for this research was provided by:
DOE (DE-SC0001939)