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Base-amplifying silicone resins generating aliphatic secondary amines autocatalytically: synthesis, characterization and application to positive-working photoresists

Crossref DOI link: https://doi.org/10.1039/C4PY01096E

Published Online: 2014-09-12

Update policy: https://doi.org/10.1039/rsc_crossmark_policy

Authors

Arimitsu, K.

Kobayashi, H.

Furutani, M.

Gunji, T.

Abe, Y.
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COPYRIGHT AND LICENSING

: The Royal Society of Chemistry has an exclusive publication licence for this journal

PUBLICATION HISTORY

: Received 10 August 2014; Accepted 11 September 2014; Accepted Manuscript published 12 September 2014; Advance Article published 1 October 2014; Version of Record published 28 October 2014

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