Facile electron-beam lithography technique for irregular and fragile substrates
Crossref DOI link: https://doi.org/10.1063/1.4900505
Published Online: 2014-10-29
Published Print: 2014-10-27
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Chang, Jiyoung
Zhou, Qin
Zettl, Alex
Funding for this research was provided by:
National Science Foundation (DMR-1206512)
U.S. Department of Energy (DE-AC02-05CH11231)