Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor–insulator–semiconductor heterojunction solar cell
Crossref DOI link: https://doi.org/10.1116/1.4921726
Published Online: 2015-05-27
Published Print: 2015-07-01
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Talkenberg, Florian
Illhardt, Stefan
Radnóczi, György Zoltán
Pécz, Béla
Schmidl, Gabriele
Schleusener, Alexander
Dikhanbayev, Kadyrjan
Mussabek, Gauhar
Gudovskikh, Alexander
Sivakov, Vladimir