Early stages of growth of Si nanowires by metal assisted chemical etching: A scaling study
Crossref DOI link: https://doi.org/10.1063/1.4928714
Published Online: 2015-08-17
Published Print: 2015-08-17
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Pal, Arindam
Ghosh, Ramesh
Giri, P. K.
Funding for this research was provided by:
Board of research in Nuclear Sciences (2012/37P/1/BRNS)
Department of Information Technology (5(9)/2012-NANO)
Council of Scientific and Industrial Research (03(1270)/13/EMR-II)