Nitride passivation of the interface between high-k dielectrics and SiGe
Crossref DOI link: https://doi.org/10.1063/1.4939460
Published Online: 2016-01-04
Published Print: 2016-01-04
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Sardashti, Kasra
Hu, Kai-Ting
Tang, Kechao
Madisetti, Shailesh
McIntyre, Paul
Oktyabrsky, Serge
Siddiqui, Shariq
Sahu, Bhagawan
Yoshida, Naomi
Kachian, Jessica
Dong, Lin
Fruhberger, Bernd https://orcid.org/0000-0002-4877-3390
Kummel, Andrew C.
