Fabrication of high aspect ratio TiO2 and Al2O3 nanogratings by atomic layer deposition
Crossref DOI link: https://doi.org/10.1116/1.4947586
Published Online: 2016-04-28
Published Print: 2016-05-01
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Shkondin, Evgeniy
Takayama, Osamu
Lindhard, Jonas Michael
Larsen, Pernille Voss
Mar, Mikkel Dysseholm
Jensen, Flemming
Lavrinenko, Andrei V.