Sub-20 nm patterning of thin layer WSe2 by scanning probe lithography
Crossref DOI link: https://doi.org/10.1063/1.4965840
Published Online: 2016-10-20
Published Print: 2016-10-17
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Dago, Arancha I.
Ryu, Yu K.
Garcia, Ricardo
Funding for this research was provided by:
Ministerio de Economía y Competitividad (MAT2013-44858-R)
Seventh Framework Programme (318804 (SNM))