Fabrication process for 200 nm-pitch polished freestanding ultrahigh aspect ratio gratings
Crossref DOI link: https://doi.org/10.1116/1.4966595
Published Online: 2016-11-02
Published Print: 2016-11-01
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Bruccoleri, Alexander R.
Heilmann, Ralf K.
Schattenburg, Mark L.