Crossmark

Surface roughness dependence of the electrical resistivity of W(001) layers

Crossref DOI link: https://doi.org/10.1063/1.4994001

Published Online: 2017-09-07

Published Print: 2017-09-07

Update policy: https://doi.org/10.1063/aip-crossmark-policy-page

Authors

Zheng, P. Y.

Zhou, T.

Engler, B. J. https://orcid.org/0000-0001-7463-0206
Chawla, J. S.

Hull, R.

Gall, D. https://orcid.org/0000-0002-5762-9307
Funding

Funding for this research was provided by:

National Science Foundation (1712752)

Defense Advanced Research Projects Agency

Microelectronics Advanced Research Corporation

Empire State Development's Division of Science, Technology and Innovation (C130117)