Sub-damage-threshold plasma etching and profile tailoring of Si through laser-stimulated thermal desorption
Crossref DOI link: https://doi.org/10.1116/1.4991586
Published Online: 2017-11-28
Published Print: 2018-03-01
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Peck, Jason A.
Ruzic, David N.