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MEMS analogous micro-patterning of thermotropic nematic liquid crystalline elastomer films using a fluorinated photoresist and a hard mask process

Crossref DOI link: https://doi.org/10.1039/C7TC03958A

Published Online: 2017

Update policy: https://doi.org/10.1039/rsc_crossmark_policy

Authors

Ditter, David

Chen, Wei-Liang

Best, Andreas

Zappe, Hans

Koynov, Kaloian

Ober, Christopher K. https://orcid.org/0000-0002-3805-3314
Zentel, Rudolf https://orcid.org/0000-0001-9206-6047
Funding

Funding for this research was provided by:

National Science Foundation (CHE-1709660, ECCS-1542081)

Deutsche Forschungsgemeinschaft (Za 276/20-1, Ze 230/26-1)
License Information

Accepted Manuscript valid from 2018-11-29
More Information

SIMILARITY CHECK

: This document is Similarity Check deposited

RELATED DATA

: Supplementary Information

IDENTIFIERS

: Kaloian Koynov (ResearcherID)

: Christopher K. Ober (ORCID)

: Rudolf Zentel (ORCID)

: Rudolf Zentel (ResearcherID)

PEER REVIEW METHOD

: Single-blind

PUBLICATION HISTORY

: Received 30 August 2017; Accepted 24 November 2017; Advance Article published 29 November 2017; Version of Record published 7 December 2017