Crossmark

Environment-controlled sol–gel soft-NIL processing for optimized titania, alumina, silica and yttria-zirconia imprinting at sub-micron dimensions

Crossref DOI link: https://doi.org/10.1039/C7NR07491C

Published Online: 2018

Update policy: https://doi.org/10.1039/rsc_crossmark_policy

Authors

Bottein, Thomas

Dalstein, Olivier

Putero, Magali

Cattoni, Andrea

Faustini, Marco

Abbarchi, Marco

Grosso, David https://orcid.org/0000-0002-9156-6848
License Information

Accepted Manuscript valid from 2018-12-08
More Information

SIMILARITY CHECK

: This document is Similarity Check deposited

IDENTIFIERS

: Magali Putero (ResearcherID)

: David Grosso (ORCID)

PEER REVIEW METHOD

: Single-blind

PUBLICATION HISTORY

: Received 9 October 2017; Accepted 2 December 2017; Accepted Manuscript published 8 December 2017; Advance Article published 5 January 2018; Version of Record published 18 January 2018