Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
Crossref DOI link: https://doi.org/10.1116/1.5003381
Published Online: 2018-01-18
Published Print: 2018-03-01
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Rontu, Ville
Sippola, Perttu
Broas, Mikael
Ross, Glenn
Sajavaara, Timo
Lipsanen, Harri
Paulasto-Kröckel, Mervi
Franssila, Sami
Funding for this research was provided by:
ECSEL Joint undertaking (2014-2-662155)
Suomen Kulttuurirahasto
Academy of Finland (251353)