LPCVD homoepitaxy of Si doped β-Ga2O3 thin films on (010) and (001) substrates
Crossref DOI link: https://doi.org/10.1063/1.5017616
Published Online: 2018-01-31
Published Print: 2018-01-29
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Rafique, Subrina
Karim, Md Rezaul http://orcid.org/0000-0002-1313-7095
Johnson, Jared M.
Hwang, Jinwoo
Zhao, Hongping
Funding for this research was provided by:
National Science Foundation (DMR-1755479)