Crossmark

Hierarchical patterns with sub-20 nm pattern fidelity <i>via</i> block copolymer self-assembly and soft nanotransfer printing

Crossref DOI link: https://doi.org/10.1039/C9PY00335E

Published Online: 2019

Update policy: https://doi.org/10.1039/rsc_crossmark_policy

Authors

Tran, Helen https://orcid.org/0000-0002-4041-7340
Bergman, Harrison M. https://orcid.org/0000-0001-6482-2837
Parenti, Kaia R.

van der Zande, Arend M. https://orcid.org/0000-0001-5104-9646
Dean, Cory R.

Campos, Luis M.
Funding

Funding for this research was provided by:

Intelligence Community Postdoctoral Research Fellowship Program

U.S. Department of Defense

Office of Naval Research (N00014-17-1-2832)
License Information

Accepted Manuscript valid from 2020-05-17
More Information

SIMILARITY CHECK

: This document is Similarity Check deposited

RELATED DATA

: Supplementary Information

IDENTIFIERS

: Helen Tran (ORCID)

: Harrison M. Bergman (ORCID)

: Kaia R. Parenti (ResearcherID)

: Arend M. van der Zande (ORCID)

: Luis M. Campos (ResearcherID)

PEER REVIEW METHOD

: Single-blind

PUBLICATION HISTORY

: Received 1 March 2019; Accepted 10 May 2019; Advance Article published 17 May 2019; Version of Record published 11 June 2019