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Bi-continuous pattern formation in thin films <i>via</i> solid-state interfacial dealloying studied by multimodal characterization

Crossref DOI link: https://doi.org/10.1039/C9MH00669A

Published Online: 2019

Update policy: https://doi.org/10.1039/rsc_crossmark_policy

Authors

Zhao, Chonghang https://orcid.org/0000-0002-3538-6199
Kisslinger, Kim

Huang, Xiaojing

Lu, Ming

Camino, Fernando

Lin, Cheng-Hung

Yan, Hanfei

Nazaretski, Evgeny https://orcid.org/0000-0003-1207-8174
Chu, Yong

Ravel, Bruce

Liu, Mingzhao https://orcid.org/0000-0002-0999-5214
Chen-Wiegart, Yu-chen Karen https://orcid.org/0000-0003-4445-2159
Funding

Funding for this research was provided by:

National Science Foundation (DMR-1752839)

U.S. Department of Energy (DE-SC0012704)

Stony Brook University

Brookhaven National Laboratory
License Information

Accepted Manuscript valid from 2020-06-19
More Information

SIMILARITY CHECK

: This document is Similarity Check deposited

RELATED DATA

: Supplementary Information

IDENTIFIERS

: Chonghang Zhao (ORCID)

: Evgeny Nazaretski (ORCID)

: Mingzhao Liu (ORCID)

: Yu-chen Karen Chen-Wiegart (ORCID)

PEER REVIEW METHOD

: Single-blind

PUBLICATION HISTORY

: Received 29 April 2019; Accepted 18 June 2019; Accepted Manuscript published 19 June 2019; Advance Article published 28 June 2019; Version of Record published 18 November 2019