Crossmark

Improved route to a diphenoxide-based precursor for chemical vapour deposition of parylene AF-4

Published Online: 2021-04-14

Published Print: 2021-04

Authors

Kast, Daniel https://orcid.org/0000-0001-7650-4094
Franz, Gerhard https://orcid.org/0000-0003-3823-3697
Senkevich, Jay J.
Funding

Funding for this research was provided by:

Staff unit centre for research promotion of the university of applied sciences Munich

Bundesministerium für Bildung und Forschung (03INT501AD)
License Information

Text and Data Mining valid from 2021-04-01
More Information

Publication History

Received: 2021-01-19

Accepted: 2021-03-22

Published: 2021-04-14

Document is current