Enhancement of replacement lithography by combination of photocleavable groups with ultrashort thiolates
Crossref DOI link: https://doi.org/10.1039/D3LF00248A
Published Online: 2024
Update policy: https://doi.org/10.1039/rsc_crossmark_policy
Fischer, Christian
Born, Florian
Terfort, Andreas https://orcid.org/0000-0003-2369-5151
Funding for this research was provided by:
Fonds der Chemischen Industrie
Version of Record valid from 2024-03-22