Crossmark

Surface chemistry in atomic layer deposition of AlN thin films from Al(CH <sub>3</sub> ) <sub>3</sub> and NH <sub>3</sub> studied by mass spectrometry

Crossref DOI link: https://doi.org/10.1039/D4TC01867B

Published Online: 2024

Update policy: https://doi.org/10.1039/rsc_crossmark_policy

Authors

Mpofu, Pamburayi https://orcid.org/0000-0003-0878-9248
Hafdi, Houyem https://orcid.org/0000-0002-9633-6427
Niiranen, Pentti https://orcid.org/0000-0002-2248-4291
Lauridsen, Jonas

Alm, Oscar

Larsson, Tommy

Pedersen, Henrik https://orcid.org/0000-0002-7171-5383
Funding

Funding for this research was provided by:

Stiftelsen för Strategisk Forskning (SSF-RMA 15-0018)
License Information

Version of Record valid from 2024-07-17