Atomic layer deposition of oxide semiconductor thin films for transistor applications: a review
Crossref DOI link: https://doi.org/10.1039/D4TC03452J
Published Online: 2024
Update policy: https://doi.org/10.1039/rsc_crossmark_policy
Hwang, Inhong
Choe, Minki
Jeon, Dahui
Baek, In-Hwan https://orcid.org/0000-0002-7201-3914
Funding for this research was provided by:
National Research Foundation of Korea (RS-2023-00279972)
Ministry of Trade, Industry and Energy (RS-2024-00409639, RS-2023-00234833)
Ministry of Education (2022R1A6C101B762)
Accepted Manuscript valid from 2025-10-31
