Crossmark

Atomic layer deposition of oxide semiconductor thin films for transistor applications: a review

Crossref DOI link: https://doi.org/10.1039/D4TC03452J

Published Online: 2024

Update policy: https://doi.org/10.1039/rsc_crossmark_policy

Authors

Hwang, Inhong

Choe, Minki

Jeon, Dahui

Baek, In-Hwan https://orcid.org/0000-0002-7201-3914
Funding

Funding for this research was provided by:

National Research Foundation of Korea (RS-2023-00279972)

Ministry of Trade, Industry and Energy (RS-2024-00409639)

Ministry of Trade, Industry and Energy (RS-2023-00234833)

Ministry of Education (2022R1A6C101B762)
License Information

Accepted Manuscript valid from 2025-10-31