Enhanced lithographic performance of polymer-bound PAG photoresists synthesized <i>via</i> RAFT polymerization
Crossref DOI link: https://doi.org/10.1039/D4PY01271B
Published Online: 2025
Update policy: https://doi.org/10.1039/rsc_crossmark_policy
Qin, Nan
Li, Na
Gao, Xiang https://orcid.org/0000-0003-2890-061X
Funding for this research was provided by:
Zhejiang University
Accepted Manuscript valid from 2026-01-02
