Modulation of microstructure and interface properties of co-sputter derived Hf1−xTixO2 thin films with various Ti content
Crossref DOI link: https://doi.org/10.1007/s10854-017-7061-9
Published Online: 2017-05-10
Published Print: 2017-09
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Das, K. C.
Ghosh, S. P.
Tripathy, N.
Singhal, R.
Kar, J. P.
License valid from 2017-05-10