Investigatory nanoscale thickness of the chemical reaction layer of sapphire substrate for the various dipping temperatures of slurry suitable in CMP
Crossref DOI link: https://doi.org/10.1007/s10854-017-7136-7
Published Online: 2017-05-26
Published Print: 2017-09
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Lin, Zone-Ching http://orcid.org/0000-0001-8948-6091
Ding, Hao-Yang
Ma, Shih-Hung
Funding for this research was provided by:
Ministry of Science and Technology, Taiwan (MOST 104-2221-E-011-002)
License valid from 2017-05-26