Effect of the thickness of Si film on Si/Se film doped silicon prepared by femtosecond laser
Crossref DOI link: https://doi.org/10.1007/s10854-017-8401-5
Published Online: 2017-12-11
Published Print: 2018-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Shi, Yuanlin
Wu, Zhiming
Du, Lingyan
Li, Siyu
Jiang, Yadong
Funding for this research was provided by:
Science Fund for Creative Research Groups (CN) (61421002)
License valid from 2017-12-11