Preparation of tantalum oxynitride thin film photocatalysts by reactive magnetron sputtering deposition under high substrate temperature
Crossref DOI link: https://doi.org/10.1007/s11164-017-3040-2
Published Online: 2017-07-29
Published Print: 2017-09
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Horiuchi, Yu
Mine, Shinya
Moriyasu, Madoka
Anpo, Masakazu
Kim, Tae-Ho
Matsuoka, Masaya
License valid from 2017-07-29