Endpoint in plasma etch process using new modified w-multivariate charts and windowed regression
Crossref DOI link: https://doi.org/10.1007/s40092-017-0186-x
Published Online: 2017-02-13
Published Print: 2017-09
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Zakour, Sihem Ben
Taleb, Hassen
License valid from 2017-02-13