Gakis, Georgios P.
Vahlas, Constantin http://orcid.org/0000-0001-5911-0296
Vergnes, Hugues
Dourdain, Sandrine
Tison, Yann
Martinez, Hervé
Bour, Jérôme
Ruch, David
Boudouvis, Andreas G.
Caussat, Brigitte http://orcid.org/0000-0003-4238-2919
Scheid, Emmanuel
Funding for this research was provided by:
Toulouse Tech Inter Lab 2016
Toulouse INP
NTUA Research Committee
This article is maintained by: Elsevier
Article Title: Investigation of the initial deposition steps and the interfacial layer of Atomic Layer Deposited (ALD) Al2O3 on Si
Journal Title: Applied Surface Science
CrossRef DOI link to publisher maintained version: https://doi.org/10.1016/j.apsusc.2019.06.215
Content Type: article
Copyright: © 2019 Elsevier B.V. All rights reserved.