Dylla-Spears, Rebecca
Wong, Lana
Miller, Philip E.
Feit, Michael D.
Steele, William
Suratwala, Tayyab
This article is maintained by: Elsevier
Article Title: Charged micelle halo mechanism for agglomeration reduction in metal oxide particle based polishing slurries
Journal Title: Colloids and Surfaces A: Physicochemical and Engineering Aspects
CrossRef DOI link to publisher maintained version: https://doi.org/10.1016/j.colsurfa.2014.01.061
Content Type: article
Copyright: Copyright © 2014 Elsevier B.V. All rights reserved.