Vigneron, P.B.
Joint, F.
Isac, N.
Colombelli, R.
Herth, E.
Funding for this research was provided by:
European Union FET-Open Grant Scheme (ULTRAQCL 665158)
This article is maintained by: Elsevier
Article Title: Advanced and reliable GaAs/AlGaAs ICP-DRIE etching for optoelectronic, microelectronic and microsystem applications
Journal Title: Microelectronic Engineering
CrossRef DOI link to publisher maintained version: https://doi.org/10.1016/j.mee.2018.09.001
Content Type: article
Copyright: © 2018 Elsevier B.V. All rights reserved.