Khan, Majid
Islam, Mohammad
Akram, Aftab
Qi, Zeming
Li, Liangbin
Funding for this research was provided by:
Higher Education Commission, Pakistan (20-1603)
This article is maintained by: Elsevier
Article Title: Residual strain and electrical resistivity dependence of molybdenum films on DC plasma magnetron sputtering conditions
Journal Title: Materials Science in Semiconductor Processing
CrossRef DOI link to publisher maintained version: https://doi.org/10.1016/j.mssp.2014.07.017
Content Type: article
Copyright: Copyright © 2014 Elsevier Ltd. All rights reserved.