Raman, Priya
Shchelkanov, Ivan
McLain, Jake
Cheng, Matthew
Ruzic, David
Haehnlein, Ian
Jurczyk, Brian
Stubbers, Robert
Armstrong, Sean
Funding for this research was provided by:
NSF Center for Lasers and Plasmas for Advanced Manufacturing (15-40030)
This article is maintained by: Elsevier
Article Title: High Deposition Rate Symmetric Magnet Pack for High Power Pulsed Magnetron Sputtering
Journal Title: Surface and Coatings Technology
CrossRef DOI link to publisher maintained version: https://doi.org/10.1016/j.surfcoat.2015.12.071
Content Type: article
Copyright: © 2015 Elsevier B.V. All rights reserved.