Trombini, H. http://orcid.org/0000-0002-7254-4774
Alencar, I.
Marmitt, G.G.
Fadanelli, R.
Grande, P.L.
Vos, M. http://orcid.org/0000-0003-2668-9216
England, J.G.
Funding for this research was provided by:
CAPES (88887.176042/2018-00)
CNPq (117750/2017-4, 165047/2015-1)
This article is maintained by: Elsevier
Article Title: Profiling As plasma doped Si/SiO2 with molecular ions
Journal Title: Thin Solid Films
CrossRef DOI link to publisher maintained version: https://doi.org/10.1016/j.tsf.2019.137536
Content Type: article
Copyright: © 2019 Elsevier B.V. All rights reserved.