Development of the sputtering yields of ArF photoresist after the onset of argon ion bombardment
Crossref DOI link: https://doi.org/10.1063/1.4772996
Published Online: 2013-01-04
Published Print: 2013-01-07
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Takeuchi, Takuya
Corbella, Carles
Grosse-Kreul, Simon
von Keudell, Achim
Ishikawa, Kenji
Kondo, Hiroki
Takeda, Keigo
Sekine, Makoto
Hori, Masaru