Band offset determination of atomic-layer-deposited Al2O3 and HfO2 on InP by internal photoemission and spectroscopic ellipsometry
Crossref DOI link: https://doi.org/10.1063/1.4774038
Published Online: 2013-01-09
Published Print: 2013-01-14
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Xu, K.
Sio, H.
Kirillov, O. A.
Dong, L.
Xu, M.
Ye, P. D.
Gundlach, D.
Nguyen, N. V.