Energy band alignment of atomic layer deposited HfO2 oxide film on epitaxial (100)Ge, (110)Ge, and (111)Ge layers
Crossref DOI link: https://doi.org/10.1063/1.4795284
Published Online: 2013-03-18
Published Print: 2013-03-21
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Hudait, Mantu K.
Zhu, Yan