Strain release management in SiGe/Si films by substrate patterning
Crossref DOI link: https://doi.org/10.1063/1.4904455
Published Online: 2014-12-15
Published Print: 2014-12-15
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Mondiali, V.
Bollani, M.
Chrastina, D.
Rubert, R.
Chahine, G.
Richard, M. I.
Cecchi, S.
Gagliano, L.
Bonera, E.
Schülli, T.
Miglio, L.
Funding for this research was provided by:
Fondazione Cariplo (Grant DefCon4 2011-0331.)