Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
Crossref DOI link: https://doi.org/10.1116/1.4853075
Published Online: 2013-12-30
Published Print: 2014-01-01
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
El Hajjam, Khalil
Baboux, Nicolas
Calmon, Francis
Souifi, Abdelkader
Poncelet, Olivier
Francis, Laurent A.
Ecoffey, Serge
Drouin, Dominique