High power pulsed magnetron sputtering: A method to increase deposition rate
Crossref DOI link: https://doi.org/10.1116/1.4916108
Published Online: 2015-03-25
Published Print: 2015-05-01
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Raman, Priya
Shchelkanov, Ivan A.
McLain, Jake
Ruzic, David N