Wafer-scale photolithography of ultra-sensitive nanocantilever force sensors
Crossref DOI link: https://doi.org/10.1063/1.5043479
Published Online: 2018-08-20
Published Print: 2018-08-20
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Pan, Ying
Miller, Calder
Trepka, Kai
Tao, Ye http://orcid.org/0000-0002-5685-246X
Funding for this research was provided by:
Rowland Institute at Harvard