Interface charge engineering at atomic layer deposited dielectric/III-nitride interfaces
Crossref DOI link: https://doi.org/10.1063/1.4793483
Published Online: 2013-02-22
Published Print: 2013-02-18
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Hung, Ting-Hsiang
Krishnamoorthy, Sriram
Esposto, Michele
Neelim Nath, Digbijoy
Sung Park, Pil
Rajan, Siddharth
Funding for this research was provided by:
Office of Naval Research (N00014-10-1-0937)