Study on the etching characteristics of amorphous carbon layer in oxygen plasma with carbonyl sulfide
Crossref DOI link: https://doi.org/10.1116/1.4780122
Published Online: 2013-01-28
Published Print: 2013-03-01
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Kim, Jong Kyu
Cho, Sung Il
Kim, Nam Gun
Jhon, Myung S.
Min, Kyung Suk
Kim, Chan Kyu
Yeom, Geun Young
