Stability and etching of titanium oxynitride films in hydrogen microwave plasma
Crossref DOI link: https://doi.org/10.1116/1.4811676
Published Online: 2013-06-20
Published Print: 2013-07-01
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Do, Hien
Yen, Tzu-Chun
Chang, Li
