The effects of plasma exposure and vacuum ultraviolet irradiation on photopatternable low-k dielectric materials
Crossref DOI link: https://doi.org/10.1063/1.4821065
Published Online: 2013-09-12
Published Print: 2013-09-14
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Nichols, M. T.
Mavrakakis, K.
Lin, Q.
Shohet, J. L.
