<i>In situ</i> study of the role of substrate temperature during atomic layer deposition of HfO2 on InP
Crossref DOI link: https://doi.org/10.1063/1.4825218
Published Online: 2013-10-16
Published Print: 2013-10-21
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Dong, H.
K.C., Santosh,
Qin, X.
Brennan, B.
McDonnell, S.
Zhernokletov, D.
Hinkle, C. L.
Kim, J.
Cho, K.
Wallace, R. M.
