Plasma enhanced layer-by-layer deposition and nanocrystallization of hydrogenated amorphous silicon films
Crossref DOI link: https://doi.org/10.1116/1.4827258
Published Print: 2013-11
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Chen, Zhuo
Mucha, John A.
Donnelly, Vincent M.
Economou, Demetre J.
